India, US Sign Pax Silica Declaration at AI Impact Summit

On 20th February 2026, India and the United States signed the Pax Silica Declaration during the India AI Impact Summit in New Delhi. With this, India formally joined the Pax Silica initiative as a signatory to the declaration.

Key Points

Strategic Technology Partnership: The Pax Silica Declaration aims to build a secure and resilient global silicon and technology ecosystem by enhancing collaboration in semiconductor manufacturing, critical minerals and AI development.
Focus on Full Silicon Stack: The partnership seeks to secure the entire value chain, from critical mineral supply and chip fabrication to AI deployment, reducing coercive dependencies and promoting trusted industrial cooperation.
Advanced Chip Design Capability: India’s engineers are currently designing advanced two-nanometer chips, reflecting growing domestic expertise in high-end semiconductor design.
Talent Pipeline Expansion: The semiconductor industry is expected to require over 10 lakh skilled professionals, with students from 315 universities and colleges already engaged in chip design initiatives.
Strengthening Free Market Collaboration: The US emphasised that Pax Silica is intended to replace coercive supply chain dependencies with trusted partnerships aligned with free-market principles.
Trusted AI Advancement: Both countries reaffirmed their commitment to promoting responsible and trusted AI globally as part of shaping the 21st-century economic and technological order.